FLOOXS » Commands » etch

etch — Commands

4 command(s) registered from src/etch/.

etch · mask · newregrid3d · strip

etch

module: etch · source: src/etch/etch.cc

Option Type Default Description
voltage Float 5.000000e+00 electrode potential of the plasma etch system
ion_neutral_rat o Float 1.000000e-02 concentration of ion:neutral flux ratio
reflected Boolean 0 compute reflected neutrals?
speed Float 6.000000e-01 speed at which CMP pad scrubs the wafer (m/s)
depthfactor Float 1.000000e+00 Characteristic length factor that accounts for the fall of pressure from top of feature to bottom
MD Boolean 0 molecular dynamics based target flux distribution
3D Boolean 0 run quasi-3D simulation assuming axisymmetry
surf_roughness Boolean 0 add surface roughness using a simple harmonic function during sputtering
targetHeight Float 8.000000e+00 distance between target and substrate in cm
targetDiameter Float 3.400000e+01 target diameter in cm
alagator Boolean 0 alagator velocity
rate String 0.0 rate default units/min
pressure Float 1.800000e+04 pressure applied at pad or in chamber in Pa
angular Float 1.000000e+01 angular distribution full width half max in degrees
sp1 Float 1.000000e+00 primary sticking probability
sp2 Float 9.000000e-01 secondary sticking probability
store String name to store the rate for this machine
dataspace Float 1.000000e-02 spacing for data to drop across the deposit
type Switch Type
isotropic Boolean 0 iso etch
oldaniso Boolean 0 aniso etch
aniso Boolean 0 aniso etch
pecvd Boolean 0 plasma enhanced CVD
plasma Boolean 0 plasma etch
cmp Boolean 0 chemical mechanical polish
sputter Boolean 0 sputter deposition
arate String 1 Alagator string to compute rate
EtchOrDep Switch etching or deposition
etch Boolean 0 etch
deposit Boolean 0 deposit
mater Switch material specification
Gas Boolean 0 a material
gas Boolean 0 a material
SiO2 Boolean 0 a material
sio2 Boolean 0 a material
Oxide Boolean 0 a material
oxide Boolean 0 a material
SpOx Boolean 0 a material
GateOx Boolean 0 a material
HfO2 Boolean 0 a material
hfo2 Boolean 0 a material
Si3N4 Boolean 0 a material
si3n4 Boolean 0 a material
Nitride Boolean 0 a material
nitride Boolean 0 a material
Silicon Boolean 0 a material
silicon Boolean 0 a material
Si Boolean 0 a material
Germanium Boolean 0 a material
Germanium Boolean 0 a material
Ge Boolean 0 a material
SiGe Boolean 0 a material
sige Boolean 0 a material
SiliconGermaniu Boolean 0 a material
SiliconGe Boolean 0 a material
SiGermanium Boolean 0 a material
4HSiC Boolean 0 a material
4hsic Boolean 0 a material
6HSiC Boolean 0 a material
6hsic Boolean 0 a material
3CSiC Boolean 0 a material
3csic Boolean 0 a material
GaN Boolean 0 a material
gan Boolean 0 a material
AlGaN Boolean 0 a material
algan Boolean 0 a material
AlN Boolean 0 a material
aln Boolean 0 a material
Polysilicon Boolean 0 a material
poly Boolean 0 a material
Poly Boolean 0 a material
polySilicon Boolean 0 a material
PolySilicon Boolean 0 a material
polySi Boolean 0 a material
PolySi Boolean 0 a material
Polysi Boolean 0 a material
Oxynitride Boolean 0 a material
oxynitride Boolean 0 a material
Photoresist Boolean 0 a material
PR Boolean 0 a material
pr Boolean 0 a material
photoresist Boolean 0 a material
Metal Boolean 0 a material
metal Boolean 0 a material
Niobium Boolean 0 a material
Nb Boolean 0 a material
niobium Boolean 0 a material
niob Boolean 0 a material
NiobiumOxide Boolean 0 a material
NbOx Boolean 0 a material
nioboxide Boolean 0 a material
niobOxide Boolean 0 a material
niobiumOxide Boolean 0 a material
niobiumoxide Boolean 0 a material
Aluminum Boolean 0 a material
Al Boolean 0 a material
Alum Boolean 0 a material
alum Boolean 0 a material
aluminum Boolean 0 a material
AluminumOxide Boolean 0 a material
AlOx Boolean 0 a material
alumoxide Boolean 0 a material
alumOxide Boolean 0 a material
aluminumOxide Boolean 0 a material
aluminumoxide Boolean 0 a material
semi Boolean 0 a material
Invisible Boolean 0 a material
Insulator Boolean 0 a material
machine_name String machine specification for etch
internal Boolean 1 included for backward compatability
time Float 1.000000e+00 etch time min
mask String mask for the aniso etch
spacing Float 2.000000e-03 fraction of the depth to etch to use as the tight grid spacing in the level set mesh
maxspac Float 5.000000e+00 mutliplier of the tight grid spacing to use as the max grid spacing in the level set mesh
grid.angle Float 1.000000e+01 place level set mesh lines when surface angle change is more than this value
skipmeshing Boolean 0 don't do any meshing mosstly for 3d debugging also copy fields to fs
tetgen Boolean 0 use tetgen for 3D remeshing instead of internal reduce
voxelinit Boolean 0 initialize levelset off vdb data structure
debug String name of the debug plot window to use default is NULL
plotdistance Float 1.000000e-02 distance between plot contours
plottime Float -1.000000e+00 time interval between plot contours (seconds)
Raw -help output
Etch
Length Scale Default is microns which can be changed with the option command
Name            Type     Default               Information
voltage         Float    5.000000e+00         electrode potential of the plasma etch system
ion_neutral_ratio Float    1.000000e-02         concentration of ion:neutral flux ratio
reflected       Boolean  0                    compute reflected neutrals?
speed           Float    6.000000e-01         speed at which CMP pad scrubs the wafer (m/s)
depthfactor     Float    1.000000e+00         Characteristic length factor that accounts for the fall of pressure from top of feature to bottom
MD              Boolean  0                    molecular dynamics based target flux distribution
3D              Boolean  0                    run quasi-3D simulation assuming axisymmetry
surf_roughness  Boolean  0                    add surface roughness using a simple harmonic function during sputtering
targetHeight    Float    8.000000e+00         distance between target and substrate in cm
targetDiameter  Float    3.400000e+01         target diameter in cm
alagator        Boolean  0                    alagator velocity
rate            String   0.0                  rate default units/min
pressure        Float    1.800000e+04         pressure applied at pad or in chamber in Pa
angular         Float    1.000000e+01         angular distribution full width half max in degrees
sp1             Float    1.000000e+00         primary sticking probability
sp2             Float    9.000000e-01         secondary sticking probability
store           String                        name to store the rate for this machine
dataspace       Float    1.000000e-02         spacing for data to drop across the deposit
type            Switch                        Type
	isotropic       Boolean  0                    iso etch
	oldaniso        Boolean  0                    aniso etch
	aniso           Boolean  0                    aniso etch
	pecvd           Boolean  0                    plasma enhanced CVD
	plasma          Boolean  0                    plasma etch
	cmp             Boolean  0                    chemical mechanical polish
	sputter         Boolean  0                    sputter deposition 
	arate           String   1                    Alagator string to compute rate
EtchOrDep       Switch                        etching or deposition
	etch            Boolean  0                    etch
	deposit         Boolean  0                    deposit
mater           Switch                        material specification
	Gas             Boolean  0                    a material
	gas             Boolean  0                    a material
	SiO2            Boolean  0                    a material
	sio2            Boolean  0                    a material
	Oxide           Boolean  0                    a material
	oxide           Boolean  0                    a material
	SpOx            Boolean  0                    a material
	GateOx          Boolean  0                    a material
	HfO2            Boolean  0                    a material
	hfo2            Boolean  0                    a material
	Si3N4           Boolean  0                    a material
	si3n4           Boolean  0                    a material
	Nitride         Boolean  0                    a material
	nitride         Boolean  0                    a material
	Silicon         Boolean  0                    a material
	silicon         Boolean  0                    a material
	Si              Boolean  0                    a material
	Germanium       Boolean  0                    a material
	Germanium       Boolean  0                    a material
	Ge              Boolean  0                    a material
	SiGe            Boolean  0                    a material
	sige            Boolean  0                    a material
	SiliconGermanium Boolean  0                    a material
	SiliconGe       Boolean  0                    a material
	SiGermanium     Boolean  0                    a material
	4HSiC           Boolean  0                    a material
	4hsic           Boolean  0                    a material
	6HSiC           Boolean  0                    a material
	6hsic           Boolean  0                    a material
	3CSiC           Boolean  0                    a material
	3csic           Boolean  0                    a material
	GaN             Boolean  0                    a material
	gan             Boolean  0                    a material
	AlGaN           Boolean  0                    a material
	algan           Boolean  0                    a material
	AlN             Boolean  0                    a material
	aln             Boolean  0                    a material
	Polysilicon     Boolean  0                    a material
	poly            Boolean  0                    a material
	Poly            Boolean  0                    a material
	polySilicon     Boolean  0                    a material
	PolySilicon     Boolean  0                    a material
	polySi          Boolean  0                    a material
	PolySi          Boolean  0                    a material
	Polysi          Boolean  0                    a material
	Oxynitride      Boolean  0                    a material
	oxynitride      Boolean  0                    a material
	Photoresist     Boolean  0                    a material
	PR              Boolean  0                    a material
	pr              Boolean  0                    a material
	photoresist     Boolean  0                    a material
	Metal           Boolean  0                    a material
	metal           Boolean  0                    a material
	Niobium         Boolean  0                    a material
	Nb              Boolean  0                    a material
	niobium         Boolean  0                    a material
	niob            Boolean  0                    a material
	NiobiumOxide    Boolean  0                    a material
	NbOx            Boolean  0                    a material
	nioboxide       Boolean  0                    a material
	niobOxide       Boolean  0                    a material
	niobiumOxide    Boolean  0                    a material
	niobiumoxide    Boolean  0                    a material
	Aluminum        Boolean  0                    a material
	Al              Boolean  0                    a material
	Alum            Boolean  0                    a material
	alum            Boolean  0                    a material
	aluminum        Boolean  0                    a material
	AluminumOxide   Boolean  0                    a material
	AlOx            Boolean  0                    a material
	alumoxide       Boolean  0                    a material
	alumOxide       Boolean  0                    a material
	aluminumOxide   Boolean  0                    a material
	aluminumoxide   Boolean  0                    a material
	semi            Boolean  0                    a material
	Invisible       Boolean  0                    a material
	Insulator       Boolean  0                    a material
machine_name    String                        machine specification for etch
internal        Boolean  1                    included for backward compatability
time            Float    1.000000e+00         etch time min
mask            String                        mask for the aniso etch
spacing         Float    2.000000e-03         fraction of the depth to etch to use as the tight grid spacing in the level set mesh
maxspac         Float    5.000000e+00         mutliplier of the tight grid spacing to use as the max grid spacing in the level set mesh
grid.angle      Float    1.000000e+01         place level set mesh lines when surface angle change is more than this value
skipmeshing     Boolean  0                    don't do any meshing mosstly for 3d debugging also copy fields to fs
tetgen          Boolean  0                    use tetgen for 3D remeshing instead of internal reduce
voxelinit       Boolean  0                    initialize levelset off vdb data structure 
debug           String                        name of the debug plot window to use default is NULL
plotdistance    Float    1.000000e-02         distance between plot contours
plottime        Float    -1.000000e+00        time interval between plot contours (seconds)
Examples:
  • Test/Coverage/cov_3d_etch_options.tcl
  • Test/Coverage/cov_adapt_split.tcl
  • Test/Coverage/cov_coordinate_ops.tcl
  • Test/Coverage/cov_crossconnect_2d.tcl
  • Test/Coverage/cov_etch_anisotropic.tcl

mask

module: etch · source: src/etch/MaskClass.cc

Option Type Default Description
list Boolean 0 list all masks
clear Boolean 0 clear the mask list
name String name of the mask
type Switch negative or positive mask
negative Boolean 1 negative mask
positive Boolean 0 positive mask
left Float -1.000000e+00 left edge
right Float 1.000000e+00 right edge
front Float -1.000000e+00 front edge
back Float 1.000000e+00 back edge
thick Float 2.500000e-01 thickness of mask
r Float 1.000000e+00 radius of a circular mask
cy Float 0.000000e+00 center y location of circular mask
cz Float 0.000000e+00 center z location of circular mask
Raw -help output
mask
Length Scale Default is microns which can be changed with the option command
Name            Type     Default               Information
list            Boolean  0                    list all masks
clear           Boolean  0                    clear the mask list
name            String                        name of the mask
type            Switch                        negative or positive mask
	negative        Boolean  1                    negative mask
	positive        Boolean  0                    positive mask
left            Float    -1.000000e+00        left edge
right           Float    1.000000e+00         right edge
front           Float    -1.000000e+00        front edge
back            Float    1.000000e+00         back edge
thick           Float    2.500000e-01         thickness of mask
r               Float    1.000000e+00         radius of a circular mask
cy              Float    0.000000e+00         center y location of circular mask
cz              Float    0.000000e+00         center z location of circular mask
Examples:
  • Test/Coverage/cov_ls_velocity_modes.tcl
  • Test/Coverage/cov_mask_positive.tcl
  • Test/process/levelset/3D/etch_aniso.tcl
  • Test/process/levelset/3D/etch_tmp.tcl
  • Test/process/levelset/3D/etch_try.tcl

newregrid3d

module: etch · source: src/etch/newregrid.cc

Option Type Default Description
mater Switch material specification
Raw -help output
Length Scale Default is microns which can be changed with the option command
Name            Type     Default               Information
mater           Switch                        material specification

strip

module: etch · source: src/etch/strip.cc

Option Type Default Description
mater Switch material specification
smooth Boolean 1 smooth gas after
Raw -help output
strip
Length Scale Default is microns which can be changed with the option command
Name            Type     Default               Information
mater           Switch                        material specification
smooth          Boolean  1                    smooth gas after
Examples:
  • Test/process/implant/Halo2D.tcl
  • Test/process/implant/HaloRot.tcl